Fabrication and characterization of Al/Ta thin films as metal junctions for solar cell applications

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dc.contributor.author Singh, Parmar, Avanish
dc.date.accessioned 2023-02-20T11:10:44Z
dc.date.available 2023-02-20T11:10:44Z
dc.date.issued 2023-03
dc.identifier.issn 25901508
dc.identifier.uri http://localhost:8080/xmlui/handle/123456789/1995
dc.description.abstract In the present work, the effect of deposition time (10 min, 20 min, and 30 min) on the structural, morphological, and electrical properties of Al/Ta thin films has been investigated. The XRD and microscopy results revealed that the thin films exhibit a bcc structure, with a strong (1 1 0) preferred orientation and followed a columnar growth with grain sizes lower than 100 nm. Thin film with 20-min deposition time exhibits less average roughness and better morphology than 10-min and 30-min. Further, the average resistance was smallest for thin films with 20-min of deposition time along with the optical reflectance between 50 and 85% in wavelength region of 400–1000 nm. The Al/Ta thin film can be employed as an excellent back-contact material for thinfilm solar cells due to its improved crystallinity, reflectance, and lower resistivity. © 2022 The Authors en_US
dc.language.iso en_US en_US
dc.publisher Elsevier B.V. en_US
dc.relation.ispartofseries ;17/100174
dc.subject Direct current magnetron sputtering en_US
dc.subject Metal junction en_US
dc.subject Sheet resistance en_US
dc.subject Ta/Al thin film en_US
dc.title Fabrication and characterization of Al/Ta thin films as metal junctions for solar cell applications en_US
dc.type Article en_US


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